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Beilstein J. Nanotechnol. 2017, 8, 1749–1759, doi:10.3762/bjnano.8.176
Figure 1: 2D profiles of uncoated Si samples processed at 5 W. Results obtained from measurements when using ...
Figure 2: 2D profiles of uncoated Si samples processed at 50 kHz. Results obtained from measurements when usi...
Figure 3: Temperature contours obtained from the numerical model at the end of the pulse at 50 kHz and 5 W fo...
Figure 4: 2D profiles of Al coated Si samples processed at 5 W. Results obtained from measurements when using...
Figure 5: 2D profiles of Al coated Si samples processed at 50 kHz. Results obtained from measurements when us...
Figure 6: 2D profiles of Au coated Si samples processed at 5 W. Results obtained from measurements when using...
Figure 7: 2D profiles of Au coated Si samples processed at 50 kHz. Results obtained from measurements when us...
Figure 8: (a) Isolated pulse on the surface of silicon, (b) Isolated pulse on the surface of silicon coated b...
Figure 9: The computational flowchart at each time step.
Figure 10: The flowchart of evaporation process.